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Processing part

Equipment

RF350 Ion source

Date of issue :2022/7/19 0:00:00

Product introduction

The RF350 ion source operates by using RF power around the RF induction coil of the plasma tank. The RF field excited the electrons in the tank, causing them to collide with the gas atoms to produce ions, creating plasma in the plasma tank of the source.

Once the plasma is ignited, the potential on the grid extracts the ions from the source and accelerates their movement toward the substrate, creating an ion beam.

Product application
The RF350 ion source provided by our company is mainly used in ion beam etching equipment (IBE) and ion beam deposition equipment (IBD).
Product features
1.Supports a wide high power operating range;
2.Excellent plasma uniformity and stability;
3.The mesh design provides a very high level of collimation;
4.Water-cooled ----suitable for low to high power operation;
5.Stable and efficient plasma operation with precise control and allowing for high repeatability
6.Ideal for load-locking production processes

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